Pulsed Laser Deposition

A versatile Pulsed Laser Deposition apparatus for material deposition has been designed and realized in our lab. This apparatus is equipped with a pulsed Nd:YAG laser. The deposition chamber hosts a quartz microbalance for thickness measurements and a ion gun for assisted deposition and/or codeposition by sputtering. Substrate can be moved to increase deposited area. 

The laser is a Continuum Powerline II 8010 (lamp pumped Q-switched Nd:YAG):
  • Wavelengths: 1064 nm, 532 nm, 355 nm, 266 nm
  • Pulse Energy: 1.6 J @1064nm
  • Pulse duration : 5-7 ns
  • Repetition rate: 10 Hz

The ion source is a 400 Watt RF ion gun producing Ar, N, O ions at 50-1000 eV. The beam has up to 6 mA/cm2 current density over a 2" spot diameter.

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PLD chamber


Ion beam for assisted deposition

Micro and Nanostructured Materials Lab, Department of Energy Politecnico di Milano Via Ponzio 34/3 I-20133 Milan, Italy