PLD apparatus with in situ characterization

A Pulsed Laser Depostion has been designed and realized in our lab. This apparatus is equipped with a UV excimer laser. The deposition chamber has CF (ConFlat) flanges and the pumping system permits to achieve 10-9 mbar vacuum level. The chamber hosts up to 4 different targets for multi-material deposition. Substrate can be moved to increase deposited aerea. The chamber has been designed to host eventually external deposition apparatus (for co-depositions) plasma diagnostics and characterzation techniques for in situ investigation of the deposited material (e.g. Raman spectroscopy).